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JOURNALS
2016
Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
ACS Applied Materials & Interfaces
Hyo Yeon Kim, Eun Ae Jung, Geumbi Mun, Raphael E. Agbenyeke, Bo Keun Park, Jin-Seong Park, Seung Uk Son, Dong Ju Jeon, Sang-Hee Ko Park, Taek-Mo Chung, and Jeong Hwan Han
2016
Effect of a rapid thermal annealing process on the electrical properties of an aluminum-doped indium zinc tin oxide thin film transistor
Physica Status Solidi A
Yunyong Nam, Jong-Heon Yang, Pilseong Jeong, Oh-Sang Kwon, Jae-Eun Pi, Sung Haeng Cho, Chi-Sun Hwang, Jeahan Ahn, Sanghyun Ji, Sang-Hee Ko Park*
2016
Beneficial effect of hydrogen in aluminum oxide deposited through the atomic layer deposition method on the electrical properties of an indium–gallium–zinc oxide thin-film transistor
Journal of Information Display
Yunyong Nam, Hee-Ok Kim, Sung Haeng Cho, Chi-Sun Hwang, Taeho Kim, Sanghun Jeon and Sang-Hee Ko Park*
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